About the role
We are seeking a highly motivated Chemist / Process Engineer (NCG) to support materials and thin-film process development for next-generation semiconductor technologies.
EquipmentOnsiteEngineering
Key Responsibilities
- Devise precursor and deposition strategies and associated intellectual property.
- Design and develop new precursors and chemical processes to find new innovative ways to create, remove or clean thin films for next generation semiconductor.
- Design, execution, and optimization of thin‑film deposition processes, including CVD-, ALD-, and PVD-based technologies, under guidance from senior engineers and scientists.
- Perform thin‑film growth or deposition experiments and support early-stage process & material development, characterization, and optimization.
- Collect, analyze, and interpret experimental and process data; document results to support development decisions.
- Prepare and execute project deliverables from planning to implementation. Prioritize the activities to achieve on-time and within budget performance objectives for the project.
Requirements
- Doctor's Degree in Chemistry, Chemical Engineering, Materials Science and Physics.
- Foundational knowledge & working experience in thin‑film deposition techniques such as CVD, ALD, MOCVD, PECVD, and/or PVD (e.g., sputtering).
- Experience on thin‑film and surface characterization techniques (e.g., XPS, AFM, SEM, TEM, ellipsometry, SIMS, AFM, XRD).
- Experience with electrochemistry or plating processes is a plus, including electroplating, electroless plating, additive chemistry, electrochemical characterization, batteries, and related film characterization.
- Experience or academic exposure to 2D materials (e.g., graphene, TMDs) growth, characterization, device or integration is a plus.
- Basic understanding of vacuum systems, plasma processes, and thin‑film tool operation, with willingness to learn hardware and process troubleshooting.